Thin Film Deposition in Bangladesh

Denton Vacuum and Moorfield deposition systems covering electron beam and thermal evaporation, sputtering and ion beam processes, in benchtop and production configurations.

17 products from 3 manufacturers: Denton Vacuum, ParteQ, Hitachi High-Tech.

Products

• Integrity — Denton Vacuum: A production evaporation system that runs both thermal and electron beam sources, configured for semiconductor, compound semiconductor and optical coating work. A temperature management system feeds a fluid cooled substrate stage, which supports small grain and textured films.
• Explorer — Denton Vacuum: A floor mounted high vacuum platform for research and pilot production that can be configured for electron beam evaporation, resistance evaporation or magnetron sputtering. Ion assisted deposition is available as an option in all three configurations.
• Discovery Isoflux — Denton Vacuum: A sputtering system built around Denton's patented inverted cylindrical magnetron cathode. The substrate sits inside the cylinder and is coated from all directions at once, which gives even coverage on curved and three dimensional parts without planetary rotation.
• Discovery V — Denton Vacuum: A planar cathode magnetron sputtering module designed to run on the Versa cluster platform. The cathode sits directly above the substrate, which gives tight uniformity in film thickness, sheet resistance and refractive index across one side of the wafer.
• Infinity Ion Beam Deposition — Denton Vacuum: An ion beam sputtering system that deposits dense films with tight thickness control, using a monoenergetic ion beam directed at a target. The Biased Target Sputter module keeps high energy ions near the target, which removes beam overspill and allows stress to be controlled.
• Infinity RM — Denton Vacuum: A pre-configured ion beam deposition system for research on demanding films such as optical interference coatings and x-ray mirror optics. Independent control of ion beam energy and flux sets film microstructure, stoichiometry and stress.
• Phoenix LC — Denton Vacuum: An in-line magnetron sputtering system for large area production, built around rectangular or round linear cathodes. An automated palletised conveyor carries substrates through the linear chambers, and both planar and three dimensional components can be processed.
• Versa Cluster Platform — Denton Vacuum: An automated cluster front end for high volume manufacturing that can carry up to two cassette load locks and six coating chambers. A semiconductor grade robotic handler moves substrates between load lock and modules, so multiple layers can be deposited without breaking vacuum.
• DV-502 — Denton Vacuum: A cabinet sized thermal evaporation system that deposits the metals and compounds used in optical coatings, metallisation and electron microscope specimen preparation. It reaches the 10-6 torr range within three minutes and works with no discernible contamination.
• DV-502B High Vacuum Evaporator — Denton Vacuum: The current diffusion pumped model in the DV-502 evaporator line, supplied with a 12 inch Pyrex bell jar and a colour touch screen control. The 1 kVA evaporation supply covers carbon, gold, gold palladium and platinum for electron microscope specimen preparation.
• DV-502B Turbo High Vacuum Evaporator — Denton Vacuum: The turbo pumped model in the DV-502 evaporator line, supplied with a 12 inch Pyrex bell jar and a colour touch screen control. It cycles from atmosphere to high vacuum quickly and evaporates carbon, gold, gold palladium and platinum without discernible contamination.
• Desktop Pro — Denton Vacuum: A compact high vacuum DC and RF sputtering system that occupies less than 36 inches of bench space. It takes one or two cathodes in a confocal arrangement for co-sputtering of metal and dielectric materials, and holds film uniformity over a 4 inch diameter.
• LambdaPro OMS — Denton Vacuum: An optical monitoring system that measures the optical thickness of a coating while it is being deposited, using reflection from or transmission through a substrate or witness chip. The deposition is then stopped at the target optical thickness rather than at a physical thickness.
• Endeavor RF Ion Source — Denton Vacuum: A filament-free radio frequency ion source with a single extraction grid, used for ion assisted deposition and pre-clean. The electron flux from the source neutralises the ion beam space charge, so no separate hot filament or hollow cathode neutraliser is required.
• PTV 10 Pulsation Free Laboratory Evaporator — ParteQ: An evaporator that delivers a steady vapour flow for laboratory and pilot scale reaction work, with very low pulsation across its flow range. It has been run with water, silanes, ethanol and mixtures, in reaction engineering and membrane technology.
• MC1000 Ion Sputter Coater — Hitachi High-Tech: The MC1000 is a magnetron ion sputter coater that deposits a thin conductive metal layer on samples before SEM observation. Platinum, gold and their palladium alloys can be applied, with the coating thickness set from the touch screen control.
• CC-106 Ion Source — Denton Vacuum: Denton describe the CC-106 as their internally developed ion source, a broad beam cold cathode DC source. It is designed for ion assisted deposition and pre-clean processes and runs on oxygen or argon. Denton publish no numerical data for it on the ion sources page, where it is listed alongside their newer filament-free Endeavor RF ion source, which the page notes is currently available on new systems.

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