By Vvon Engineering Team | Published | Updated
A complete 2026 buyer's guide to nanotechnology equipment in Bangladesh, covering scanning electron microscopes (SEM), Raman spectrometers, atomic layer deposition (ALD), AFM instruments, nano-fabrication systems, and how to set up a well-equipped nanotechnology laboratory at a Bangladeshi university or research institute.
A nanotechnology equipment specification should connect the research question to a measurable result. This guide helps procurement teams, department heads and researchers compare characterisation and fabrication systems, the infrastructure they need and the evidence to request before buying in Bangladesh.
Nanotechnology equipment falls into two broad categories: characterisation instruments (which analyse materials at the nanoscale) and fabrication systems (which create nano-scale structures and devices). Most university laboratories start with characterisation equipment. It is more versatile, less infrastructure-intensive, and enables a wider range of research programmes. Fabrication systems are added as research programmes mature and specific device-making capabilities are needed.
| Category | Equipment Type | What It Does | Typical Applications |
|---|---|---|---|
| Characterisation | Scanning Electron Microscope (SEM) | Images surfaces at nanometre resolution using a focused electron beam | Materials science, failure analysis, semiconductor inspection, biological imaging |
| Characterisation | Transmission Electron Microscope (TEM) | Images internal structure of thin samples at atomic resolution | Crystal structure, defect analysis, nanoparticle characterisation |
| Characterisation | Atomic Force Microscope (AFM) | Maps surface topography and mechanical properties at nanometre scale | Surface roughness, thin film measurement, polymer science, biological samples |
| Characterisation | Raman Spectrometer | Identifies chemical composition and molecular structure using laser light scattering | Graphene, 2D materials, pharmaceutical analysis, carbon nanotubes, semiconductors |
| Characterisation | X-ray Diffractometer (XRD) | Determines crystal structure and phase composition | Thin films, ceramics, pharmaceuticals, metals |
| Fabrication | Atomic Layer Deposition (ALD) | Builds films through repeated, self-limiting surface-reaction cycles; growth per cycle depends on chemistry | Semiconductor devices, solar cells, energy storage, catalysis |
| Fabrication | Chemical Vapour Deposition (CVD) | Deposits thin films from gas-phase precursors | Graphene growth, semiconductor films, hard coatings |
| Fabrication | Reactive Ion Etching (RIE/ICP-RIE) | Etches nano-scale patterns into materials using plasma | Semiconductor device fabrication, MEMS, photonics |
| Fabrication | Photolithography / E-beam Lithography | Patterns nano-scale features onto substrates | Microelectronics, MEMS, photonic devices, research prototyping |
| Fabrication | Spin Coater | Deposits uniform thin films of photoresist or other materials | Lithography preparation, thin film research, solar cells |
Compare suppliers through documented technical capability, the manufacturer relationship for the exact product and the proposed service arrangements. Supplier category or country of manufacture alone does not establish quality. The table lists evidence to request from each route.
| Purchase route | Evidence to request | Decision consideration |
|---|---|---|
| Local supplier or distributor | Current product-specific authorisation where claimed, named service responsibilities, spares and training scope | Assess local support and manufacturer escalation against the application |
| Scientific equipment integrator or trader | Product provenance, technical competence, warranty issuer and service subcontractors | Evaluate the actual offer rather than assume capability from supplier type |
| Direct manufacturer | Regional service arrangements, import responsibilities and local installation requirements | Compare complete delivered and supported cost, not the factory price alone |
Ask each bidder to state response targets, remote support, travel costs, critical-parts sourcing and tasks that require manufacturer attendance. Do not assume a fixed overseas waiting time or that every represented brand has the same local service coverage.
SEM selection should be based on required feature size, landing energy, detector mode, specimen geometry and throughput. The following Hitachi families illustrate different configurations; confirm the current model and application performance in the manufacturer quotation.
| Model | Type | Performance evidence to request | Best For |
|---|---|---|---|
| Hitachi SU3800/SU3900 | Variable Pressure SEM | Current datasheet conditions and demonstration on representative specimens | Materials science, failure analysis, biological samples without coating. The SU3900 takes the larger chamber, up to 300 mm across |
| Hitachi SU5000 | Field Emission SEM (FE-SEM) | Current datasheet conditions and demonstration on representative specimens | Advanced materials, nanoparticles, semiconductor research |
| Hitachi TM4000PlusII/TM4000II | Tabletop SEM | Current datasheet conditions and demonstration on representative specimens | Teaching labs, quality control, routine inspection at a lower cost entry point. A TM4000PlusIII/TM4000III generation is also published |
| Hitachi SU8600 | Cold Field Emission SEM | Current datasheet conditions and demonstration on representative specimens | High-resolution surface imaging and demanding low-voltage applications |
Raman microscopy measures inelastic light scattering to investigate molecular bonding and crystal-related features. Renishaw inVia configurations support applications including carbon materials, polymers and semiconductors. Excitation, fluorescence, optical access and laser-induced sample change should be assessed with representative spectra before choosing a configuration.
ALD repeats self-limiting surface reactions; it does not necessarily deposit a complete atomic layer in every cycle. Growth, nucleation, temperature and precursor transport determine the film. Oxford Instruments offers ALD and other plasma deposition and etch platforms; compare the process window, substrate size and film evidence for the intended application.
| Oxford Instruments System | Process | Applications |
|---|---|---|
| Atomfab | Atomic layer deposition | High-k dielectrics, barrier and passivation layers, conformal coatings |
| PlasmaPro 100 ICP-RIE | Inductively coupled plasma etch | Deep silicon and III-V etching, MEMS, photonic devices |
| PlasmaPro 100 RIE | Reactive ion etching | Semiconductor device fabrication and general pattern transfer |
| PlasmaPro 100 PECVD / ICPCVD | Plasma enhanced deposition | Silicon nitride and oxide films at low substrate temperature |
| PlasmaPro 100 Nano CVD | Nanomaterial growth | Graphene and nanomaterial synthesis. Oxford publish this as the former Nanofab |
| Ionfab | Ion beam etch and deposition | Precision milling and optical coatings |
Define the research questions and representative samples first. Compare shared access with purchase, then assess the building and complete operating budget. Prepare performance-based specifications with measurable acceptance tests and confirm any grant eligibility from the current call. Public procurement should be assessed against applicable law, the PPR 2025 framework and the approved funding agreement, including any transition provisions; PPR 2008 is not the current blanket default. Private institutions must follow their applicable policies and funding conditions. Agree manufacturing, delivery, installation and training milestones in the quotation rather than assume a universal schedule. Define maintenance and warranty obligations in the contract.
| Research Area | Essential Equipment | Application question to define |
|---|---|---|
| Graphene and 2D materials | Renishaw Raman spectrometer, Hitachi FE-SEM, CVD system | Layer count, defects, strain and composition on the actual substrate |
| Pharmaceutical nanotechnology | Raman spectrometer, AFM, particle size analyser | Particle size distribution, solid state and formulation stability |
| Solar cell research | Raman spectrometer, SEM, ALD system, thin film deposition | Film quality, device response and repeatable test conditions |
| Semiconductor devices | FE-SEM, TEM, ALD, ICP-RIE, e-beam lithography | Feature geometry, interfaces, electrical behaviour and process compatibility |
| Biomaterials and tissue engineering | SEM, AFM, confocal microscope | Surface structure and preparation artefacts for the intended sample |
| Corrosion and materials failure | SEM with EDS, XRD, AFM | Failure mechanism, phases and representative sampling |
| Nuclear materials | SEM, TEM, XRD, ion beam systems | Composition, structure and any radiation-control requirements |
Vvon's nano-fabrication catalogue brings together microscopy, spectroscopy, deposition, patterning and related research equipment. Product families include Hitachi, Oxford Instruments, Renishaw, SUSS MicroTec, Coherent and Thorlabs. Ask for the current model, manufacturer documentation and the project-specific scope when requesting a quotation.
| Work package | Confirm in the proposal |
|---|---|
| Laboratory planning | Equipment requirements, scope of layout advice and responsibility for engineered building systems |
| Funding proposal input | Technical requirements and dated budget estimates against the actual call |
| Technical specification | Performance criteria, specimen tests and procurement-neutral wording where required |
| Import and delivery | Responsible party, documentation, taxes, access and unloading |
| Installation and acceptance | Qualified personnel, included tests and manufacturer attendance |
| Training | User groups, competence criteria, format and follow-up |
| Service | Covered products/tasks, response targets, exclusions, spares and warranty terms |
Buy first for a funded measurement need with enough expected use and a credible operating plan. SEM and Raman can serve several materials groups, but particle sizing, thermal analysis, AFM or shared access may be better for a particular programme. Compare the specimen list and bottleneck before selecting an instrument.
The schedule depends on configuration, manufacturing, permits, freight, customs, site readiness and specialist attendance. Request a dated schedule with dependencies and review points. Installation and application qualification are separate milestones, and neither has one reliable duration for all instruments.
Vvon can discuss technical specifications and budget inputs for an equipment proposal. Provide the actual grant call and institutional requirements. The institution is responsible for eligibility, submission and compliance; supplier input cannot guarantee selection. Contact +8801805987890 or info@vvon.com.bd.
Use the selected model's installation document for temperature, humidity, vibration, magnetic fields, power, cooling, gases and ventilation. Limits vary markedly between a tabletop SEM, field-emission system and plasma tool. Agree who surveys the site and who signs off readiness before delivery.
Ask Vvon to confirm service arrangements for the exact model, including locally performed tasks, manufacturer escalation, parts, training and contract exclusions. Availability and coverage are product-specific and should be recorded in the quotation.
Send your research questions, sample types, required measurements, floor plan and budget stage to Vvon for a configuration discussion. Call +8801805987890 or write to info@vvon.com.bd.
Share your application, equipment requirements and procurement timeline. Our engineers can help clarify the configuration and scope for your enquiry.