Brand: Moorfield Nanotechnology | Category: Nanotechnology
A compact benchtop RF and DC magnetron sputtering system for research laboratories and cleanrooms. It deposits metals, oxides, nitrides and multilayers on substrates up to 4 inches, with reactive and co-deposition options.
| Parameter | Value |
|---|---|
| Base pressure | 5x10-7 mbar |
| Sputter sources | up to 3 x 2 inch water cooled magnetrons |
| Maximum substrate size | 4 inch (100 mm) |
| Process gas inlets | up to 3 MFC controlled gases |
| Specification | Substrate heating up to 500 deg C optional, up to 600 deg C with 4-bulb configuration |
| Footprint | 800 x 500 x 550 mm |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for Moorfield Nanotechnology.
Phone: +880 1711-738207 | Email: info@vvon.com.bd