Lithography & Patterning in Bangladesh

Lithography & Patterning from SUSS MicroTec and Durham Magneto Optics, supplied, installed and supported in Bangladesh by Vvon Technologies.

21 products from 2 manufacturers: SUSS MicroTec, Durham Magneto Optics.

Products

• MA/BA Gen4 Series Mask and Bond Aligner — SUSS MicroTec: A semi-automated mask aligner and imprint platform for contact and proximity lithography. It exposes photoresist through a physical mask and also runs UV nanoimprint, serving MEMS and NEMS, advanced packaging, micro-optics and compound semiconductor work in research and pilot production.
• MJB4 Manual Mask Aligner — SUSS MicroTec: A compact manual mask aligner for research and small volume production. It takes pieces from 5 by 5 mm up to 100 mm wafers, prints in soft, hard and vacuum contact, and also supports UV nanoimprint lithography on fragile materials.
• MA300 Gen3 Mask Aligner — SUSS MicroTec: An automated mask aligner for 200 mm and 300 mm wafers in advanced packaging. It patterns through silicon vias, redistribution layers and bumping levels by proximity lithography, and copes with thick resist films that fall outside stepper capability.
• MA200 Gen3 Mask Aligner — SUSS MicroTec: A fully automated mask aligner for high volume production of wafers and square substrates up to 200 mm. It pairs DirectAlign alignment with MO Exposure Optics illumination and ThermAlign thermal compensation for MEMS, radio frequency and power device manufacturing.
• NIL-SFT12 Series Stamp Fabrication Tool — SUSS MicroTec: A stamp fabrication tool that replicates working stamps for nanoimprint lithography on 300 mm substrates. UV and thermal stamp making sit in one frame, and the high UV irradiance shortens replication from hours to minutes with tight critical dimension control.
• NIL-SFT8 Series Stamp Fabrication Tool — SUSS MicroTec: A table-top tool that makes working stamps for micro and nanoimprint lithography, sized to match the 8 inch MA/BA Gen4 mask aligners. UV-LED curing cuts stamp replication from hours to minutes for LED, MEMS, micro-optics and augmented reality applications.
• DSC300 Gen3 Projection Scanner — SUSS MicroTec: An automated projection lithography scanner for advanced packaging on 300 mm and 200 mm wafers. Wynne-Dyson optics print 2 µm lines and spaces with a large depth of focus, and the stitchless full field scan removes step field size limits on the layout.
• LabSpin Series Spin Coater and Developer — SUSS MicroTec: A manual bench-top spin coater and developer for photolithography in laboratories. It spreads resist and other chemicals evenly over round or square substrates, and can be fitted with dispense, edge bead removal, puddle developer and nitrogen drying options.
• RCD8 Semi-Automated Coater and Developer — SUSS MicroTec: A semi-automated resist coating and developing module for wafers up to 200 mm. It suits research and small scale production, handling everything from very thin films to highly viscous thick resists, and runs alone or inside a SUSS LabCluster.
• HP8 Hot Plate for Manual Coating — SUSS MicroTec: A compact manual hot plate for the soft bake, post exposure bake and hard bake steps of a research coating line. It takes round substrates up to 200 mm or 6 inch squares and uses coil heating with three lifting pins for handling.
• ECD8 Semi-Automated Coater or Developer — SUSS MicroTec: A compact semi-automated spin coater or developer for substrates up to 200 mm. It has an integrated media cabinet, a transparent hood that keeps the process in view and one-hand wafer centring, and is configured either as a coater or as a developer.
• AS8 Manual Spray Coater for High Topographies — SUSS MicroTec: A manual spray coater that lays resist over deep three dimensional structures where spin coating cannot reach. Programmable spray and cleaning paths give even edge coverage without resist pooling in trenches, on substrates up to 200 mm.
• ACS300 Gen2 Automated Coater and Developer — SUSS MicroTec: A fully automated cluster coater and developer for 200 mm and 300 mm wafers. Coating, baking and developing modules share one frame, so both wafer sizes run without mechanical changeover, from pilot lines through to high volume manufacturing.
• ACS200 Gen3 Automated Coater and Developer — SUSS MicroTec: An automated cluster coater and developer for wafers from 100 mm to 200 mm. Modular frames scale from research use up to high volume manufacturing, and the GYRSET closed cover method holds a solvent rich layer over the wafer for stable film thickness.
• ACS200 Gen3 TE Automated Coater and Developer — SUSS MicroTec: A throughput enhanced version of the ACS200 Gen3 cluster coater and developer for wafers from 100 mm to 200 mm. Up to six spinner modules can be fitted, and special tooling handles warped, ultra-thin and stacked wafers used in advanced packaging.
• ASx Series Photomask Processing Platform — SUSS MicroTec: An automated photomask processing platform that carries out advanced bake, resist strip, clean and develop steps in one system. A 25 zone hotplate holds the bake temperature closely, which is what sets critical dimension uniformity on advanced masks.
• MaskTrack Pro Series Photomask Cleaning Platform — SUSS MicroTec: A photomask cleaning and processing platform built for extreme ultraviolet lithography, 193i immersion work at 1x nm half-pitch and nanoimprint masks. The modular frame can be clustered with third party tools so storage, handling and processing stay in one controlled environment.
• MicroWriter ML3 Baby — Durham Magneto Optics: An entry level desktop direct write optical lithography machine. It exposes photoresist patterns straight from a design file without a mask, and is aimed at university and industrial research groups working on microelectronics, MEMS and microfluidics.
• MicroWriter ML3 Baby Plus — Durham Magneto Optics: A desktop direct write lithography machine with two software selectable resolutions, so critical and non-critical areas of a pattern can be exposed in one run. It adds an optical surface profiler and automatic wafer inspection to the Baby platform.
• MicroWriter ML3 Mesa — Durham Magneto Optics: A desktop direct write lithography machine offering three software selectable resolutions down to 0.6 um. It is used for microelectronics, spintronics, MEMS, sensors and microfluidics work where sub-micron critical features sit alongside coarse structures.
• MicroWriter ML3 Pro — Durham Magneto Optics: The top model in the MicroWriter ML3 family, supplied on a passive vibration isolation optical table. It writes over a 195 mm square area at four selectable resolutions and includes a virtual mask aligner mode and multiple wafer handling for overnight runs.

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