Denton Vacuum in Bangladesh

Vvon Technologies Limited supplies, installs and services Denton Vacuum equipment across Bangladesh. 24 products are catalogued across Nanotechnology.

Categories

• Thin Film Deposition (15)
• Plasma Etching & Deposition (5)
• Electron Microscopy & Microanalysis (3)
• Photoluminescence & Time-Resolved Spectroscopy (1)

Products

• Infinity FA System: An etching tool for semiconductor failure analysis, thin film profiling and delayering. It combines ion beam etch, reactive ion beam etch and chemically assisted ion beam etch so that layers of mixed composition can be removed at matched rates.
• BenchTop Turbo: A compact high vacuum system for low voltage resistive thermal evaporation and sputtering, sized to fit within 32 inches of bench width. It is used for high vacuum carbon coating, high resolution microscopy coatings and rotary shadowing, and is run from a touch screen interface.
• Desk V: A bench top sample preparation system that combines magnetron sputtering with thermal carbon evaporation for electron microscopy. An adjustable rotating and tilting stage gives even coverage on samples with irregular surfaces, and a broad range of coating materials including iridium can be deposited.
• Discovery Confocal: A magnetron sputtering system for high volume production that handles substrates up to 300 mm. It takes either a single cathode for tight uniformity or up to four confocal cathodes with triaxis adjustment for co-sputtering without breaking vacuum.
• Infinity Ion Beam Etch: A production wafer etch system for ion beam etching, thin film profile milling and glancing angle milling. A built-in tilting chuck allows etching at an angle, and an optional SIMS endpoint detector terminates the etch on the chosen layer.
• Phoenix PIB-CVD: An in-line large area coating system built around Denton's patented linear ion source, running the tunable Plasma Ion Beam CVD process. Ion energy and gas ratio can be adjusted to give anything from a soft flowable encapsulation layer to a hard, hydrophobic and optically clear coating.
• Voyager PE-CVD: A plasma enhanced chemical vapour deposition system focused on diamond-like carbon, able to coat flat wafers and three dimensional parts such as optical lenses. An optional chamber configuration allows metals to be co-sputtered during deposition to give metal doped DLC films.
• Voyager PIB-CVD: A plasma ion beam chemical vapour deposition system built around the filament-free Endeavor RF ion source, aimed at diamond-like nanocomposite films. Deposition runs below 100 degrees C, so polycarbonate and PMMA substrates can be coated directly.
• Plasma Emission Monitoring (PEM): A closed loop control system for transition mode, high rate reactive sputtering of metal oxides and nitrides. It reads a plasma emission line in real time and adjusts the reactive gas setpoint to hold intensity constant, which avoids target poisoning and keeps deposition rates near metal mode.
• Integrity: A production evaporation system that runs both thermal and electron beam sources, configured for semiconductor, compound semiconductor and optical coating work. A temperature management system feeds a fluid cooled substrate stage, which supports small grain and textured films.
• Explorer: A floor mounted high vacuum platform for research and pilot production that can be configured for electron beam evaporation, resistance evaporation or magnetron sputtering. Ion assisted deposition is available as an option in all three configurations.
• Discovery Isoflux: A sputtering system built around Denton's patented inverted cylindrical magnetron cathode. The substrate sits inside the cylinder and is coated from all directions at once, which gives even coverage on curved and three dimensional parts without planetary rotation.
• Discovery V: A planar cathode magnetron sputtering module designed to run on the Versa cluster platform. The cathode sits directly above the substrate, which gives tight uniformity in film thickness, sheet resistance and refractive index across one side of the wafer.
• Infinity Ion Beam Deposition: An ion beam sputtering system that deposits dense films with tight thickness control, using a monoenergetic ion beam directed at a target. The Biased Target Sputter module keeps high energy ions near the target, which removes beam overspill and allows stress to be controlled.
• Infinity RM: A pre-configured ion beam deposition system for research on demanding films such as optical interference coatings and x-ray mirror optics. Independent control of ion beam energy and flux sets film microstructure, stoichiometry and stress.
• Phoenix LC: An in-line magnetron sputtering system for large area production, built around rectangular or round linear cathodes. An automated palletised conveyor carries substrates through the linear chambers, and both planar and three dimensional components can be processed.
• Versa Cluster Platform: An automated cluster front end for high volume manufacturing that can carry up to two cassette load locks and six coating chambers. A semiconductor grade robotic handler moves substrates between load lock and modules, so multiple layers can be deposited without breaking vacuum.
• DV-502: A cabinet sized thermal evaporation system that deposits the metals and compounds used in optical coatings, metallisation and electron microscope specimen preparation. It reaches the 10-6 torr range within three minutes and works with no discernible contamination.
• DV-502B High Vacuum Evaporator: The current diffusion pumped model in the DV-502 evaporator line, supplied with a 12 inch Pyrex bell jar and a colour touch screen control. The 1 kVA evaporation supply covers carbon, gold, gold palladium and platinum for electron microscope specimen preparation.
• DV-502B Turbo High Vacuum Evaporator: The turbo pumped model in the DV-502 evaporator line, supplied with a 12 inch Pyrex bell jar and a colour touch screen control. It cycles from atmosphere to high vacuum quickly and evaporates carbon, gold, gold palladium and platinum without discernible contamination.
• Desktop Pro: A compact high vacuum DC and RF sputtering system that occupies less than 36 inches of bench space. It takes one or two cathodes in a confocal arrangement for co-sputtering of metal and dielectric materials, and holds film uniformity over a 4 inch diameter.
• LambdaPro OMS: An optical monitoring system that measures the optical thickness of a coating while it is being deposited, using reflection from or transmission through a substrate or witness chip. The deposition is then stopped at the target optical thickness rather than at a physical thickness.
• Endeavor RF Ion Source: A filament-free radio frequency ion source with a single extraction grid, used for ion assisted deposition and pre-clean. The electron flux from the source neutralises the ion beam space charge, so no separate hot filament or hollow cathode neutraliser is required.
• CC-106 Ion Source: Denton describe the CC-106 as their internally developed ion source, a broad beam cold cathode DC source. It is designed for ion assisted deposition and pre-clean processes and runs on oxygen or argon. Denton publish no numerical data for it on the ion sources page, where it is listed alongside their newer filament-free Endeavor RF ion source, which the page notes is currently available on new systems.