Brand: Denton Vacuum | Category: Nanotechnology
Denton describe the CC-106 as their internally developed ion source, a broad beam cold cathode DC source. It is designed for ion assisted deposition and pre-clean processes and runs on oxygen or argon. Denton publish no numerical data for it on the ion sources page, where it is listed alongside their newer filament-free Endeavor RF ion source, which the page notes is currently available on new systems.
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Contact Vvon Technologies Limited about Denton Vacuum equipment requirements in Bangladesh.
Phone: +880 1711-738207 | Email: info@vvon.com.bd
A compact benchtop RF and DC magnetron sputtering system for research laboratories and cleanrooms. It deposits metals, oxides, nitrides and multilayers on substrates up to 4 inches, with reactive and co-deposition options.
The MC1000 is a magnetron ion sputter coater that deposits a thin conductive metal layer on samples before SEM observation. Platinum, gold and their palladium alloys can be applied, with the coating thickness set from the touch screen control.
A wide area version of the benchtop nanoPVD sputtering platform for larger research substrates. It keeps RF and DC magnetron process flexibility while extending coverage to 8 inch substrates for photovoltaic, sensor and transparent conductive oxide work.