Moorfield Nanotechnology in Bangladesh

Vvon Technologies Limited supplies, installs and services Moorfield Nanotechnology equipment across Bangladesh. 17 products are catalogued across Nanotechnology.

Categories

• Electron Microscopy & Microanalysis (13)
• Plasma Etching & Deposition (3)
• Nanomaterial Synthesis (1)

Products

• nanoPVD-S10A Benchtop PVD System: A compact benchtop RF and DC magnetron sputtering system for research laboratories and cleanrooms. It deposits metals, oxides, nitrides and multilayers on substrates up to 4 inches, with reactive and co-deposition options.
• nanoPVD-S10A-WA Wide-Area PVD System: A wide area version of the benchtop nanoPVD sputtering platform for larger research substrates. It keeps RF and DC magnetron process flexibility while extending coverage to 8 inch substrates for photovoltaic, sensor and transparent conductive oxide work.
• nanoPVD-T15A Thermal Evaporation System: A benchtop thermal and low temperature evaporation system for metals, organics and sensitive materials. It gives research groups local evaporation capability for electrodes, contact layers, organic electronics and optical films.
• nanoPVD-ST15A Hybrid PVD System: A hybrid benchtop system that combines magnetron sputtering with thermal and low temperature evaporation in a single chamber. It suits multilayer thin films, hybrid device stacks, contacts and seed layers where the process route is not yet fixed.
• MiniLab 026: The most compact MiniLab modular PVD platform, designed to be glovebox compatible. It supports sputtering plus thermal and low temperature evaporation on substrates up to 6 inches, with HiPIMS and pulsed DC available by configuration.
• MiniLab 030 Compact Modular PVD System: A compact front loading modular vacuum deposition system built on a single rack. It covers magnetron sputtering, thermal, low temperature and e-beam evaporation for metals, dielectrics and organics, and offers a glovebox mating interface.
• MiniLab 070: A modular PVD platform for advanced sputtering and multi-technique research. It takes up to four 3 inch sputter sources, e-beam and thermal evaporation, and supports load lock and dual chamber configurations on substrates up to 8 inches.
• MiniLab 080: A modular PVD system built around e-beam evaporation capability with sputtering available by configuration. It is used for solar cell, sensing and imaging research on substrates up to 8 inches, with RF and DC substrate bias.
• MiniLab 090: A glovebox compatible modular PVD system with front and rear door configuration, aimed at air sensitive materials and protected transfer. It is used for perovskite, OLED and organic optoelectronic thin film research.
• MiniLab 125: The highest capability MiniLab modular PVD platform, taking substrates up to 12 inches and up to five sputter sources. It adds nanoparticle sources, residual gas analysis, ion beam and beam assisted deposition for demanding research programmes.
• Nanoparticle System: A nanoparticle source integrated into a Moorfield modular PVD configuration. It adds gas phase nanoparticle deposition to a conventional thin film platform for functional coatings, nanostructured films and hybrid materials.
• Small Batch Coater: A small batch modular PVD configuration that bridges research work and pilot scale coating. It runs thermal evaporation, e-beam evaporation and magnetron sputtering with recipe driven operation and optional mask or substrate automation.
• Glovebox PVD Systems: Glovebox integrated PVD systems for air sensitive materials and protected device workflows. Samples move between the glovebox and the deposition chamber without exposure to air, which suits perovskites, OLEDs and organic electronics.
• nanoCVD-8G: A benchtop chemical vapour deposition system for graphene, carbon nanomaterials and advanced materials growth. It gives research groups local CVD process development without the footprint of a production derived CVD tool.
• nanoETCH: A compact plasma etching and surface modification system for low damage process development. It is used on 2D materials, graphene, silicon and oxide layers, and for substrate cleaning and surface activation before deposition.
• nanoANNEAL: A benchtop thermal processing and annealing system for post deposition treatment. It is used for contact formation, crystallisation and interface work in photovoltaic, semiconductor and coatings research.
• nanoCVD-WGP: Moorfield name the nanoCVD-WGP as one of the two systems in their nanoCVD range, alongside the nanoCVD-8G. The CVD systems page states that these systems are designed for research scale graphene synthesis, that both models provide performance in graphene and 2D material production, and that with a focus on reliability and scalability they cover both small scale and wafer scale research. No specification is published for the WGP on the current site.