Brand: Denton Vacuum | Category: Nanotechnology
A plasma ion beam chemical vapour deposition system built around the filament-free Endeavor RF ion source, aimed at diamond-like nanocomposite films. Deposition runs below 100 degrees C, so polycarbonate and PMMA substrates can be coated directly.
| Parameter | Value |
|---|---|
| Deposition temperature | below 100 degrees C |
| Source | filament-free Endeavor RF ion source with independent control of ion current density and ion energy |
| Substrate size | small components up to 200 mm wafers |
| Specification | Optional chamber configuration for co-sputtering during DLN deposition |
| Control | Denton ProcessPro system, compatible with the Versa cluster architecture |
| Applications | flexible and scratch-resistant displays, wear coatings, IR transparent films, hydrophobic coatings |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for Denton Vacuum.
Phone: +880 1711-738207 | Email: info@vvon.com.bd