Brand: Durham Magneto Optics | Category: Nanotechnology
The top model in the MicroWriter ML3 family, supplied on a passive vibration isolation optical table. It writes over a 195 mm square area at four selectable resolutions and includes a virtual mask aligner mode and multiple wafer handling for overnight runs.
| Parameter | Value |
|---|---|
| Maximum writing area | 195 mm x 195 mm, 295 mm x 295 mm optional |
| Maximum wafer size | 230 mm x 230 mm x 15 mm, larger sizes optional |
| Minimum feature sizes | 0.6 um, 1 um, 2 um and 5 um, 0.4 um optional |
| Specification | 385 nm long life semiconductor light source, 365 nm and dual wavelength optional |
| Specification | XY interferometer with 1 nm resolution, 4 nm sample stage resolution |
| Alignment accuracy | plus or minus 0.5 um, 3 sigma |
Contact Vvon Technologies Limited about Durham Magneto Optics equipment requirements in Bangladesh.
Phone: +880 1711-738207 | Email: info@vvon.com.bd
A semi-automated mask aligner and imprint platform for contact and proximity lithography. It exposes photoresist through a physical mask and also runs UV nanoimprint, serving MEMS and NEMS, advanced packaging, micro-optics and compound semiconductor work in research and pilot production.
A desktop direct write lithography machine offering three software selectable resolutions down to 0.6 um. It is used for microelectronics, spintronics, MEMS, sensors and microfluidics work where sub-micron critical features sit alongside coarse structures.
A compact manual mask aligner for research and small volume production. It takes pieces from 5 by 5 mm up to 100 mm wafers, prints in soft, hard and vacuum contact, and also supports UV nanoimprint lithography on fragile materials.