Brand: SUSS MicroTec | Category: Nanotechnology
An automated bake and develop platform for photomask production down to sub 32 nm masks. Dry flip handling, a feedback loop driven by measured critical dimension data and megasonic assisted development keep results consistent across long production runs.
| Parameter | Value |
|---|---|
| Mask capability | up to sub 32 nm masks, 90 nm backward compatibility |
| Production | down to 1x nm half-pitch |
| Surface temperature control | 90 °C to 130 °C |
| Hotplate | 25 zones |
| Environment | DIN EN ISO 14644 Class 2 |
| Factory interface | SECS/GEM 200/300 mm, SEMI S2, S8 and S13 compliant |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for SUSS MicroTec.
Phone: +880 1711-738207 | Email: info@vvon.com.bd