Brand: SUSS MicroTec | Category: Nanotechnology
A manual bench-top spin coater and developer for photolithography in laboratories. It spreads resist and other chemicals evenly over round or square substrates, and can be fitted with dispense, edge bead removal, puddle developer and nitrogen drying options.
| Parameter | Value |
|---|---|
| Spin speed | 50 to 8,000 rpm with 200 mm chuck |
| Acceleration | 200 rpm/s up to 3,000 rpm/s |
| LabSpin6 substrates | up to 150 mm round or 100 x 100 mm square |
| LabSpin8 substrates | up to 200 mm round or 150 x 150 mm square |
| Recipes | up to 200 recipes with 40 steps each |
| Installation | table-top, wet bench, glove box or SUSS LabCluster |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for SUSS MicroTec.
Phone: +880 1711-738207 | Email: info@vvon.com.bd