Brand: SUSS MicroTec | Category: Nanotechnology
A photomask cleaning and processing platform built for extreme ultraviolet lithography, 193i immersion work at 1x nm half-pitch and nanoimprint masks. The modular frame can be clustered with third party tools so storage, handling and processing stay in one controlled environment.
| Parameter | Value |
|---|---|
| Processes | 193i 1x nm half-pitch double patterning, EUV lithography and nanoimprint masks |
| Architecture | modular and extendable for clustering with third party products |
| Cleaning | dual megasonic, high-pressure Fulljet, brush, in-situ SC1/SPM and UV dry cleaning |
| Developing | A+ nozzle dispense with ASONIC megasonic technology |
| Environment | DIN EN ISO 14644 Class 2 |
| Compliance | SEMI S2, S8 and S13, CE marked, SECS/GEM 200/300 mm interface |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for SUSS MicroTec.
Phone: +880 1711-738207 | Email: info@vvon.com.bd