Brand: Durham Magneto Optics | Category: Nanotechnology
An entry level desktop direct write optical lithography machine. It exposes photoresist patterns straight from a design file without a mask, and is aimed at university and industrial research groups working on microelectronics, MEMS and microfluidics.
| Parameter | Value |
|---|---|
| Maximum writing area | 149 mm x 149 mm |
| Maximum wafer size | 155 mm x 155 mm x 7 mm |
| Minimum feature size | 1 um across the full writing area |
| Specification | 405 nm long life semiconductor light source, 385 nm and 365 nm optional |
| Writing speed | up to 50 mm2 per minute at 1 um minimum feature size |
| Specification | XY interferometer with 15 nm resolution, 100 nm minimum addressable grid |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for Durham Magneto Optics.
Phone: +880 1711-738207 | Email: info@vvon.com.bd