Brand: Hitachi High-Tech | Category: Nanotechnology
Quantax75 is one of the EDS systems Hitachi offer with the TM4000 series tabletop microscopes, using a built-in detector made by Bruker Nano GmbH. Hitachi note that every detector in this range is of compact design and needs no liquid nitrogen. The system gives local spectra observation at specified points, high speed colourised X-ray mapping, a hypermap function that returns spot analysis, line analysis and mapping results from a single acquisition, and live deconvolution so that overlapping peaks are separated and mapped in real time.
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The AZtec series gives the TM series tabletop microscopes a choice of EDS systems, with built-in detectors made by Oxford Instruments and an energy resolution of 129 eV (Mn-Ka) available in all classes. Hitachi list three configurations: AZtecOneXplore as standard, AZtecLiveOneXplore with the live EDS function, and AZtecLiveLite as the multi-featured analysis instrument. The TruMap feature separates multi element spectra and subtracts background in real time so that element maps are free of contamination from overlapping peaks, while pile-up correction and TruQ technologies support high throughput analysis. AZtecLiveLite adds large area mapping and particle analysis through a motorised stage.
The Element series are EDX systems for Hitachi's TM series tabletop microscopes, produced by EDAX Instruments. A Si3N4 detector window optimises low energy X-ray transmission for light element analysis, which Hitachi say improves mapping speed and detection limits over a conventional detector window, and a hexagonal support grid raises transmission further. APEX software supplies multi user logins, user configurable windows, customisable reporting, simplified automation, fast mapping, simultaneous collection and review, and spectrum match libraries. The sample configuration shown is in combination with a TM4000 series instrument.
An etching tool for semiconductor failure analysis, thin film profiling and delayering. It combines ion beam etch, reactive ion beam etch and chemically assisted ion beam etch so that layers of mixed composition can be removed at matched rates.