Brand: Oxford Instruments | Category: Nanotechnology
The PlasmaPro 100 RIE delivers isotropic and anisotropic dry etching across a wide process range. A single RF plasma source sets both ion density and energy, with load lock and cassette to cassette options for repeatable research and production work up to 200 mm.
| Parameter | Value |
|---|---|
| Operating pressure | 5 to 500 mTorr |
| Power density | 0.1 to 1.5 W/cm2 |
| Total gas flow | 5 to 200 sccm |
| DC bias generated on lower electrode | 30 to 800 V |
| Electrode temperature range | -150 °C to 400 °C |
| Specification | Clusters with up to 4 process modules |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for Oxford Instruments.
Phone: +880 1711-738207 | Email: info@vvon.com.bd