Brand: Oxford Instruments | Category: Nanotechnology
The PlasmaPro 100 ALE applies a cyclical, digital etch process for precise depth control on nanoscale layers. Built on the Cobra ICP platform, it removes material with low damage and smooth surfaces for GaN HEMT recess etching and 2D material patterning.
| Parameter | Value |
|---|---|
| Electrode temperature range | -150 °C to +400 °C |
| ICP source sizes | 65 mm, 180 mm, 300 mm |
| Specification | Process uniformity up to 200 mm wafers |
| Specification | Accommodates substrates up to 10 mm thick |
| Specification | Wafer clamping with helium backside cooling |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for Oxford Instruments.
Phone: +880 1711-738207 | Email: info@vvon.com.bd