Brand: Oxford Instruments | Category: Nanotechnology
Atomfab is a plasma enhanced atomic layer deposition system built for volume production of GaN power and RF devices. A remote plasma source designed for atomic scale processing gives low damage passivation and gate dielectric films, with clusterable automated wafer handling.
| Parameter | Value |
|---|---|
| Plasma ALD Al2O3 at 300 °C, within wafer thickness uniformity | <±1.0% |
| Plasma ALD Al2O3 at 300 °C, wafer to wafer thickness repeatability | <±1.0% |
| Plasma ALD Al2O3 at 300 °C, breakdown voltage | >=7.0 MV/cm |
| Plasma exposure time | 250 ms |
| Plasma strike time | 80 ms |
| Specification | Remote plasma ALD with controlled ion energy from near zero to 30 eV |
Contact Vvon Technologies Limited, Bangladesh's authorised distributor for Oxford Instruments.
Phone: +880 1711-738207 | Email: info@vvon.com.bd